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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | LAUN, Joachim | - |
| dc.contributor.author | De Smet, Yana | - |
| dc.contributor.author | Van de Reydt, Emma | - |
| dc.contributor.author | KRIVCOV, Alexander | - |
| dc.contributor.author | Trouillet, Vanessa | - |
| dc.contributor.author | Welle, Alexander | - |
| dc.contributor.author | Möbius, Hildegard | - |
| dc.contributor.author | Barner-Kowollik, Christopher | - |
| dc.contributor.author | JUNKERS, Tanja | - |
| dc.date.accessioned | 2018-02-28T15:52:10Z | - |
| dc.date.available | 2018-02-28T15:52:10Z | - |
| dc.date.issued | 2018 | - |
| dc.identifier.citation | CHEMICAL COMMUNICATIONS, 54 (7), p. 751-754 | - |
| dc.identifier.issn | 1359-7345 | - |
| dc.identifier.uri | http://hdl.handle.net/1942/25575 | - |
| dc.description.abstract | A 2D laser lithography protocol for controlled grafting of polymer brushes in a single-step is presented. A series of polyacrylates were grafted from silicon substrates via laser-induced copper-mediated radical polymerization. Film thicknesses up to 39 nm were reached within 125 μs of exposure to UV laser light (351 nm). Successful block copolymerization underpinned the controlled nature of the grafting methodology. The resolution of a small structure of grafted PHEA reached 270 μm and was limited by the type of laser used in the study. Further, a checkerboard pattern of PtBA and POEGA was produced and imaged via time-of-flight secondary ion mass spectrometry (ToF-SIMS), and X-ray photoelectron spectroscopy (XPS). | - |
| dc.description.sponsorship | T. J. and J. L. are grateful for funding from the Fonds Wetenschappelijk Onderzoek (FWO) in the form of a project grant and a PhD scholarship. The K-Alpha+ instrument was financially supported by the Federal Ministry of Economics and Technology on the basis of a decision by the German Bundestag. C. B.-K. acknowledges support from the Australian Research Council (ARC) in the form of a Laureate Fellowship, key support from the Queensland University of Technology (QUT) as well as continued support via the STN program of the Helmholtz association at the Karlsruhe Institute of Technology (KIT). | - |
| dc.language.iso | en | - |
| dc.rights | This journal is © The Royal Society of Chemistry 2018 | - |
| dc.subject.other | 2D laser lithography; photoinduced copper-mediated radical polymerization; reversible deactivation radical polymerization | - |
| dc.title | 2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization | - |
| dc.type | Journal Contribution | - |
| dc.identifier.epage | 754 | - |
| dc.identifier.issue | 7 | - |
| dc.identifier.spage | 751 | - |
| dc.identifier.volume | 54 | - |
| local.bibliographicCitation.jcat | A1 | - |
| dc.description.notes | Junkers, T (reprint author), Univ Hasselt, Inst Mat Res IMO, Polymer React Design Grp, Martelarenlaan 42, B-3500 Hasselt, Belgium. christopher.barnerkowollik@qut.edu.au; tanja.junkers@uhasselt.be | - |
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| local.type.refereed | Refereed | - |
| local.type.specified | Article | - |
| dc.identifier.doi | 10.1039/c7cc08444g | - |
| dc.identifier.isi | 000422989400011 | - |
| item.validation | ecoom 2019 | - |
| item.contributor | LAUN, Joachim | - |
| item.contributor | De Smet, Yana | - |
| item.contributor | Van de Reydt, Emma | - |
| item.contributor | KRIVCOV, Alexander | - |
| item.contributor | Trouillet, Vanessa | - |
| item.contributor | Welle, Alexander | - |
| item.contributor | Möbius, Hildegard | - |
| item.contributor | Barner-Kowollik, Christopher | - |
| item.contributor | JUNKERS, Tanja | - |
| item.accessRights | Open Access | - |
| item.fullcitation | LAUN, Joachim; De Smet, Yana; Van de Reydt, Emma; KRIVCOV, Alexander; Trouillet, Vanessa; Welle, Alexander; Möbius, Hildegard; Barner-Kowollik, Christopher & JUNKERS, Tanja (2018) 2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization. In: CHEMICAL COMMUNICATIONS, 54 (7), p. 751-754. | - |
| item.fulltext | With Fulltext | - |
| crisitem.journal.issn | 1359-7345 | - |
| crisitem.journal.eissn | 1364-548X | - |
| Appears in Collections: | Research publications | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Laun et al photoCMP last author version.pdf | Peer-reviewed author version | 814.03 kB | Adobe PDF | View/Open |
| Laun et al photoCMP - Supporting Information_ REVISED.pdf | Supplementary material | 1.2 MB | Adobe PDF | View/Open |
| c7cc08444g.pdf Restricted Access | Published version | 1.69 MB | Adobe PDF | View/Open Request a copy |
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