Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/3026
Title: High electrical resistivity of CVD-diamond
Authors: MANCA, Jean 
NESLADEK, Milos 
Neelen, M
QUAEYHAEGENS, Carl 
DE SCHEPPER, Luc 
DE CEUNINCK, Ward 
Issue Date: 1999
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Source: MICROELECTRONICS RELIABILITY, 39(2). p. 269-273
Abstract: Due to its combination of excellent thermo-mechanical properties and electrical properties such as the high electrical resistivity and high dielectric strength, diamond seems a promising material for specialized dielectric applications. Due to the great advances in the growth technology of diamond films by chemical vapour deposition (CVD) on e.g. Si-substrates, new applications can be expected in microelectronics. An important technological result for dielectric applications is that high electrical resistivity diamond films can be obtained after an appropriate heat treatment of the as-grown films. (C) 1999 Elsevier Science Ltd. All rights reserved.
Notes: Limburgs Univ Ctr, Inst Mat Res, Div Mat Phys, B-3590 Diepenbeek, Belgium.Manca, JV, Limburgs Univ Ctr, Inst Mat Res, Div Mat Phys, Wetenschapspk 1, B-3590 Diepenbeek, Belgium.
Document URI: http://hdl.handle.net/1942/3026
DOI: 10.1016/S0026-2714(98)00225-X
ISI #: 000080532100019
Type: Journal Contribution
Validations: ecoom 2000
Appears in Collections:Research publications

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