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http://hdl.handle.net/1942/31506| Title: | Spatially-separated atomic layer deposition of Al<inf>2</inf>O<inf>3</inf>, a new option for high-throughput si solar cell passivation | Authors: | VERMANG, Bart Werner, F. Stals, W. Lorenz Rothschild, A. John, J. POORTMANS, Jef Mertens, R. Gortzen, R. Poodt, P. Roozeboom, F. Schmidt, J. |
Issue Date: | 2011 | Source: | p. 001144 -001149 | Series/Report no.: | 37 | Document URI: | http://hdl.handle.net/1942/31506 | ISBN: | 978-1-4244-9965-6 978-1-4244-9966-3 978-1-4244-9964-9 |
DOI: | 10.1109/pvsc.2011.6186155 | Category: | C1 | Type: | Proceedings Paper |
| Appears in Collections: | Research publications |
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