Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/31510
Title: Blistering in ALD Al2O3 passivation layers as rear contacting for local Al BSF Si solar cells
Authors: VERMANG, Bart 
Goverde, H
Uruena, A
Lorenz
Cornagliotti, E
Rothschild, A
John, J
POORTMANS, Jef 
Mertens, R
Issue Date: 2012
Publisher: ELSEVIER SCIENCE BV
Source: Solar energy materials and solar cells, 101 , p. 204 -209
Abstract: Random Al back surface field (BSF) p-type Si solar cells are presented, where a stack of Al2O3 and SiNx is used as rear surface passivation layer containing blisters. It is shown that no additional contact opening step is needed, since during co-firing local Al BSFs are induced at the location of these blisters. The best fill factors and short circuit currents are obtained in the case of (i) a hydrophobic pre-passivation cleaning, since it leads to a small density of larger blisters, and (ii) 10 nm of Al2O3, where the blistering size still increases during firing thanks to additional out-gassing. There is an apparent gain in J(SC) and V-OC of, respectively, 1.3 mA/cm(2) and 5 mV for the best random Al BSF cells compared to full Al BSF reference cells, because of better rear internal reflection and rear surface passivation. (C) 2012 Elsevier B.V. All rights reserved.
Keywords: Si;PERC;Local Al BSF;Surface passivation;Atomic layer deposition;Al2O3
Document URI: http://hdl.handle.net/1942/31510
ISSN: 0927-0248
e-ISSN: 1879-3398
DOI: 10.1016/j.solmat.2012.01.032
ISI #: WOS:000303957000034
Rights: 2012 Elsevier B.V. All rights reserved.
Category: A1
Type: Journal Contribution
Appears in Collections:Research publications

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