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http://hdl.handle.net/1942/3198
Title: | Localized monitoring of electromigration with early resistance change measurements | Authors: | MANCA, Jean CROES, Kristof DE CEUNINCK, Ward D'Haeger, V D'HAEN, Jan Depauw, P Tielemans, L DE SCHEPPER, Luc |
Issue Date: | 1998 | Publisher: | PERGAMON-ELSEVIER SCIENCE LTD | Source: | MICROELECTRONICS AND RELIABILITY, 38(4). p. 641-650 | Abstract: | A new approach is presented in order to study the local effects of electromigration in metallisations. So-called localized electrical resistance measurements allow us to detect and localize the formation of individual voids and hillocks in metallisation lines submitted to current and temperature stress. Localized electrical resistance measurements are performed by adding a number of voltage terminals at equal distances on the test structure and by measuring the resistance drift of each line segment. Through the use of such a multi-voltage probe (MVP) test structure, the sensitivity of the electrical resistance to the presence of defects is strongly increased. By comparing the observed electrical resistance drift results with the corresponding SEM micrographs? important conclusions can be drawn concerning the nature of the resistance changes. With finite element calculations a quantitative interpretation is obtained of the observed local resistance changes. An additional feature of localized electrical resistance measurements is the possibility to determine the actual temperature profile present in a test strip at the beginning of a current stress experiment, i.e., prior to failure formation. (C) 1998 Elsevier Science Ltd. All rights reserved. | Notes: | Limburgs Univ Ctr, Div Mat Phys, Inst Mat Res, IMO, B-3590 Diepenbeek, Belgium. DESTIN NV, B-3590 Diepenbeek, Belgium. Alcatel MIETEC, B-9700 Oudenaarde, Belgium.Manca, JV, Limburgs Univ Ctr, Div Mat Phys, Inst Mat Res, IMO, B-3590 Diepenbeek, Belgium. | Document URI: | http://hdl.handle.net/1942/3198 | DOI: | 10.1016/S0026-2714(97)00191-1 | ISI #: | 000073592200018 | Type: | Journal Contribution | Validations: | ecoom 1999 |
Appears in Collections: | Research publications |
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