Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/33898
Title: Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
Authors: Henderick, Lowie
HAMED, Hamid 
Mattelaer, Felix
Minjauw, Matthias
Meersschaut, Johan
Dendooven, Jolien
SAFARI, Momo 
Vereecken, Philippe
Detavernier, Christophe
Issue Date: 2021
Publisher: ELSEVIER
Source: Journal of Power Sources, 497 (Art N° 229866)
Abstract: PE-ALD of nitrogen doped Ti-phosphate has been investigated in two dierent deposition processes. Both processes were analysed by in-situ ellipsometry (to monitor the growth of the lm) and X-ray photoelectron spectroscopy/elastic recoil detection (to study the composition). First, previous knowledge on rapid PE-ALD of undoped Ti-phosphate using an exposure sequence of trimethyl phosphate plasma-oxygen plasma-titanium isopropoxide, i.e. TMP*-O* 2-TTIP, was used to 1
Keywords: Atomic layer deposition;Plasma-enhanced deposition;Nitrogen doping;Titanium phosphate;Lithium-ion battery;Functional coating
Document URI: http://hdl.handle.net/1942/33898
ISSN: 0378-7753
e-ISSN: 1873-2755
DOI: 10.1016/j.jpowsour.2021.229866
ISI #: WOS:000647598400007
Rights: 2021 Elsevier B.V. All rights reserved.
Category: A1
Type: Journal Contribution
Validations: ecoom 2022
Appears in Collections:Research publications

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