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http://hdl.handle.net/1942/3609
Title: | An activation-energy study of the microstructural changes in al-1-percent-si interconnects | Authors: | Stulens, Herwig KNUYT, Gilbert DE CEUNINCK, Ward DE SCHEPPER, Luc STALS, Lambert |
Issue Date: | 1994 | Publisher: | AMER INST PHYSICS | Source: | JOURNAL OF APPLIED PHYSICS, 75(4). p. 2270-2277 | Abstract: | There are several reasons to believe that the microstructural changes in Al-Si interconnects has to be described in terms of a spectrum of activation energies rather than in terms of a single activation energy. In this article, a method is presented to extract a spectrum of activation energies from an isothermal and a constant heating rate experiment. The formalism was applied to the relaxation behavior of passivated Al-1%Si interconnects. The method of analysis shows that the microstructural relaxation mechanisms in these interconnects are characterized by a narrow spectrum, centered at an energy of about 1.2 eV. | Notes: | STULENS, H, LIMBURGS UNIV CENTRUM,INST MAT RES,DIV MAT PHYS,SCI PK,B-3590 DIEPENBEEK,BELGIUM. | Document URI: | http://hdl.handle.net/1942/3609 | DOI: | 10.1063/1.356291 | ISI #: | A1994MX65400064 | Type: | Journal Contribution |
Appears in Collections: | Research publications |
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