Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/5719
Title: Characterization of the early stages of electromigration in Al-based metal lines by means of a high resloution resistance monitoring technique based on an extremely stable ambient temperature
Authors: DE CEUNINCK, Ward 
DE SCHEPPER, Luc 
STALS, Lambert 
d' Haeger, V.
Issue Date: 1996
Source: Proceedings of the Materials Research Symposium, San Diego (USA), 9-12 April 1996. p. 133-140.
Document URI: http://hdl.handle.net/1942/5719
Type: Proceedings Paper
Appears in Collections:Research publications

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