Characterization of the early stages of electromigration in Al-based metal lines by means of a high resloution resistance monitoring technique based on an extremely stable ambient temperature

Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/5719

Title:	Characterization of the early stages of electromigration in Al-based metal lines by means of a high resloution resistance monitoring technique based on an extremely stable ambient temperature
Authors:	DE CEUNINCK, Ward DE SCHEPPER, Luc STALS, Lambert d' Haeger, V.
Issue Date:	1996
Source:	Proceedings of the Materials Research Symposium, San Diego (USA), 9-12 April 1996. p. 133-140.
Document URI:	http://hdl.handle.net/1942/5719
Type:	Proceedings Paper
Appears in Collections:	Research publications

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