Reliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scale

Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/8139

Title:	Reliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scale
Authors:	DE CEUNINCK, Ward D'Haeger, V Stulens, Herwig DE SCHEPPER, Luc STALS, Lambert
Issue Date:	1994
Publisher:	MATERIALS RESEARCH SOC
Source:	Murarka, SP Katz, A Tu, KN Maex, K (Ed.) ADVANCED METALLIZATION FOR DEVICES AND CIRCUITS - SCIENCE, TECHNOLOGY AND MANUFACTURABILITY. p. 663-668.
Series/Report:	MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Notes:	LIMBURGS UNIV CENTRUM, INST MAT RES, DIV MAT PHYS, DIEPENBEEK, B-3590 BELGIUM.
Document URI:	http://hdl.handle.net/1942/8139
ISBN:	1-55899-237-5
ISI #:	A1994BB59J00086
Type:	Proceedings Paper
Appears in Collections:	Research publications

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