Watermark-induced high-density via failures in submicron CMOS fabrication (May 2006)

Abstract

Laureen Carbonell received the diploma in chemistry from the Ecole Nationale Superieure de Chimie de Toulouse (ENSCT), France, in 1996, From 1997 until 2000, she carried out her Ph.D. degree in materials science at the Laboratoire de Mineralogic-Cristallographie de Paris (LMCP), France, focusing on the epitaxial growth and characterization of ferromagnetic layers onto ZnSe-based semiconductors. Since 2000; she has been with the Interuniversity Microelectronics Center (IMEC), Leuven, Belgium, where her R&D activity has been focusing on copper electroplating in sub-100-nm interconnects. She has authored and coauthored more than 40 publications