Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/13806
Title: Dewetting of Patterned Silicon Substrates Leading to a Selective Deposition of Micellar-Based Nanoparticles
Authors: Riskin, Alexander 
De Dobbelaere, Christopher 
Shan, Lianchen 
Boyen, Hans-Gerhard 
D'Haen, Jan 
Hardy, An 
Van Bael, Marlies K. 
Issue Date: 2012
Publisher: AMER CHEMICAL SOC
Source: JOURNAL OF PHYSICAL CHEMISTRY C, 116 (19), p. 10743-10752
Abstract: We have applied soft lithography for the indirect patterning of micellar poly(styrene-b-2-vinyl pyridine) diblock copolymers loaded with gold chloric acid with a pattern width below a micrometer. A combination of physical and chemical heterogeneities on the substrate induced a selective deposition of the micelles in between the relief structures without the need for additional liftoff or annealing steps. Micelle size, dip coating speed, and height of the relief pattern were identified as important parameters to achieve a successful selective deposition. Finally, a single layer of patterned gold nanoparticles was formed inside the micropattern using an oxygen plasma treatment.
Notes: [Riskin, A.; De Dobbelaere, C.; Shan, L.; Boyen, H. G.; D'Haen, J.; Hardy, A.; van Bael, M. K.] Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium. [Shan, L.; Boyen, H. G.; D'Haen, J.; van Bael, M. K.] Imec Vzw Div IMOMEC, B-3590 Diepenbeek, Belgium.
Keywords: carbon nanotubes; metallic nanodots; block-copolymers; soft lithography; ordered arrays; cvd synthesis; resonance; growth; resist; films
Document URI: http://hdl.handle.net/1942/13806
ISSN: 1932-7447
e-ISSN: 1932-7455
DOI: 10.1021/jp211775q
ISI #: 000304073700038
Rights: © 2012 American Chemical Society.
Category: A1
Type: Journal Contribution
Validations: ecoom 2013
Appears in Collections:Research publications

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