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Title: | Dewetting of Patterned Silicon Substrates Leading to a Selective Deposition of Micellar-Based Nanoparticles | Authors: | RISKIN, Alexander DE DOBBELAERE, Christopher SHAN, Lianchen BOYEN, Hans-Gerd D'HAEN, Jan HARDY, An VAN BAEL, Marlies |
Issue Date: | 2012 | Publisher: | AMER CHEMICAL SOC | Source: | JOURNAL OF PHYSICAL CHEMISTRY C, 116 (19), p. 10743-10752 | Abstract: | We have applied soft lithography for the indirect patterning of micellar poly(styrene-b-2-vinyl pyridine) diblock copolymers loaded with gold chloric acid with a pattern width below a micrometer. A combination of physical and chemical heterogeneities on the substrate induced a selective deposition of the micelles in between the relief structures without the need for additional liftoff or annealing steps. Micelle size, dip coating speed, and height of the relief pattern were identified as important parameters to achieve a successful selective deposition. Finally, a single layer of patterned gold nanoparticles was formed inside the micropattern using an oxygen plasma treatment. | Notes: | [Riskin, A.; De Dobbelaere, C.; Shan, L.; Boyen, H. G.; D'Haen, J.; Hardy, A.; van Bael, M. K.] Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium. [Shan, L.; Boyen, H. G.; D'Haen, J.; van Bael, M. K.] Imec Vzw Div IMOMEC, B-3590 Diepenbeek, Belgium. | Keywords: | carbon nanotubes; metallic nanodots; block-copolymers; soft lithography; ordered arrays; cvd synthesis; resonance; growth; resist; films | Document URI: | http://hdl.handle.net/1942/13806 | ISSN: | 1932-7447 | e-ISSN: | 1932-7455 | DOI: | 10.1021/jp211775q | ISI #: | 000304073700038 | Rights: | © 2012 American Chemical Society. | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2013 |
Appears in Collections: | Research publications |
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Dewetting of patterned sillicon substrates.pdf Restricted Access | Published version | 6.33 MB | Adobe PDF | View/Open Request a copy |
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