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http://hdl.handle.net/1942/1459| Title: | Plasma deposition of thiophene derivatives under atmospheric pressure | Authors: | DAMS, Roel VANGENEUGDEN, Dirk VANDERZANDE, Dirk |
Issue Date: | 2006 | Publisher: | Wiley | Source: | CHEMICAL VAPOR DEPOSITION, 12(12). p. 719-727 | Abstract: | Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3-methylthiophene, and 3,4-ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV-vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4-ethylenedioxythiophene). Conductivities of up to 1 x 10(-2) S cm(-1) are measured. | Keywords: | plasma, atmospheric pressure, conjugated polymer, conducting polymer, thiophene | Document URI: | http://hdl.handle.net/1942/1459 | ISSN: | 0948-1907 | DOI: | 10.1002/cvde.200606483 | ISI #: | 000243466000005 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2008 |
| Appears in Collections: | Research publications |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Plasma Deposition.pdf | Peer-reviewed author version | 355.91 kB | Adobe PDF | View/Open |
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