Please use this identifier to cite or link to this item:
http://hdl.handle.net/1942/1459
Title: | Plasma deposition of thiophene derivatives under atmospheric pressure | Authors: | DAMS, Roel VANGENEUGDEN, Dirk VANDERZANDE, Dirk |
Issue Date: | 2006 | Publisher: | Wiley | Source: | CHEMICAL VAPOR DEPOSITION, 12(12). p. 719-727 | Abstract: | Plasma deposition of conjugated polymer films under atmospheric pressure is described. Three thiophene derivatives (thiophene, 3-methylthiophene, and 3,4-ethylenedioxythiophene) are used as monomers. The plasma depositions with the various precursors are compared using analytical techniques such as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, UV-vis spectroscopy, and resistance measurements. Good results are obtained with pulsed plasma depositions of poly(3,4-ethylenedioxythiophene). Conductivities of up to 1 x 10(-2) S cm(-1) are measured. | Keywords: | plasma, atmospheric pressure, conjugated polymer, conducting polymer, thiophene | Document URI: | http://hdl.handle.net/1942/1459 | ISSN: | 0948-1907 | DOI: | 10.1002/cvde.200606483 | ISI #: | 000243466000005 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2008 |
Appears in Collections: | Research publications |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
Plasma Deposition.pdf | Peer-reviewed author version | 355.91 kB | Adobe PDF | View/Open |
SCOPUSTM
Citations
39
checked on Aug 29, 2025
WEB OF SCIENCETM
Citations
42
checked on Sep 2, 2025
Google ScholarTM
Check
Altmetric
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.