Please use this identifier to cite or link to this item:
|Title:||Seeding, growth and characterization of nanocrystalline diamond films on various substrates||Authors:||DAENEN, Michael
|Issue Date:||2006||Publisher:||Wiley||Source:||PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 203(12). p. 3005-3010||Abstract:||By optimizing seeding techniques and plasma parameters for deposition, nanocrystalline diamond (NCD) films were deposited on different sorts of substrates with varying parameters such as temperature and methane content. Results of this optimization process were analysed by SEM, XRD, Raman, and transmission measurements. Experiments with titanium interlayers lead to a better understanding of the nucleation step and can enhance the nucleation density. This research resulted in homogeneously coalesced NCD films of less than 100 nm thickness over 3 inch Si wafers. It is also shown that it is possible to grow on different sorts of glass, using a low temperature process||Keywords:||71.20.Mq • 78.67.Bf • 81.05.Uw • 81.07.Bc • 81.15.Gh||Document URI:||http://hdl.handle.net/1942/1584||ISSN:||0031-8965||DOI:||10.1002/pssa.200671122||ISI #:||000240967400003||Category:||A1||Type:||Journal Contribution||Validations:||ecoom 2007|
|Appears in Collections:||Research publications|
Show full item record
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.