Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/26547
Title: Two-Step Nanoscale Approach for Well-Defined Complex Alkanethiol Films on Au Surfaces
Authors: NEUPANE, Shova 
LOSADA-PEREZ, Patricia 
VIVEGNIS, Sebastien 
Mekhalif, Zineb
Delhalle, Joseph
Bashir, Asif
RENNER, Frank 
Issue Date: 2018
Publisher: AMER CHEMICAL SOC
Source: LANGMUIR, 34(1), p. 66-72
Abstract: Controlling the molecular organization of organic self-assembled monolayers (SAM) is of utmost importance in nanotechnology, molecular electronics, and surface science. Here we propose two well-differentiated approaches, double printing based on micro-contact printing (mu-cp) and molecular backfilling adsorption, to produce complex alkanethiol films. The resulting films on model Au surfaces were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle measurements. Double printing alkanethiols results in clear coexisting regions where no molecular displacement is observed, highlighting the slow diffusion rates of long alkanethiols and large attractive interaction between long alkyl chains. Exposing a single-print mu-cp Au substrate to an additional alkanethiol solution yields the formation of differently ordered domain boundaries with different thickness and micrometer lateral size. The high order is a result of enhanced molecular mobility and restructuring during solution backfilling. The formed molecular assemblies constitute an excellent testing ground for nanoscale phenomena that strongly depend on the nanoscale geometrical and chemical features of the surface such as designed functionality or corrosion initiation and inhibition.
Notes: [Neupane, S.; Losada-Perez, P.; Vivegnis, S.; Renner, F. U.] Hasselt Univ, Inst Mat Res IMO, B-3590 Diepenbeek, Belgium. [Neupane, S.; Losada-Perez, P.; Renner, F. U.] IMEC Vzw, Div IMOMEC, B-3590 Diepenbeek, Belgium. [Vivegnis, S.; Mekhalif, Z.; Delhalle, J.] Univ Namur, Lab Chem & Electrochem Surfaces CES, 61 Rue Bruxelles, B-5000 Namur, Belgium. [Bashir, A.] Thyssenkrupp Bilstein GmbH, Niederkell 25, D-54429 Mandern, Germany. [Losada-Perez, P.] ULB, Soft Matter Phys Lab, Campus La Plaine,CP223,Blvd Triomphe, B-1050 Brussels, Belgium.
Document URI: http://hdl.handle.net/1942/26547
ISSN: 0743-7463
DOI: 10.1021/acs.langmuir.7b02760
ISI #: 000422611500009
Rights: © 2017 American Chemical Society
Category: A1
Type: Journal Contribution
Validations: ecoom 2019
Appears in Collections:Research publications

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