Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/2857
Title: In-situ SEM observation of electromigration in thin metal films at accelerated stress conditions
Authors: D'HAEN, Jan 
VAN OLMEN, Jan 
BEELEN, Zjef 
MANCA, Jean 
MARTENS, Tom 
DE CEUNINCK, Ward 
D'OLIESLAEGER, Marc 
DE SCHEPPER, Luc 
Cannaerts, M
Maex, K
Issue Date: 2000
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Source: MICROELECTRONICS RELIABILITY, 40(8-10). p. 1407-1412
Abstract: With so-called in-situ SEM experiments, electromigration experiments are performed in a SEM (scanning electron microscope) equipped with a heating stage. BSE (back scattered electron) images are taken continuously over the entire length of a metal line submitted to high current and temperature stress, monitoring in detail the microstructure. Comparing the electrical resistance curves with the corresponding SEM micrographs and with ex-situ AFM measurements leads to detailed qualitative and quantitative information about the occurring electromigration and precipitation / dissolution effects in the metal lines. (C) 2000 Elsevier Science Ltd. All rights reserved.
Notes: Limburgs Univ Ctr, Inst Mat Res, B-3590 Diepenbeek, Belgium. Katholieke Univ Leuven, B-3001 Heverlee, Belgium. IMEC, B-3001 Heverlee, Belgium.d'Haen, J, Limburgs Univ Ctr, Inst Mat Res, Wetenschapspk, B-3590 Diepenbeek, Belgium.
Document URI: http://hdl.handle.net/1942/2857
DOI: 10.1016/S0026-2714(00)00170-0
ISI #: 000089532800028
Category: A1
Type: Journal Contribution
Validations: ecoom 2001
Appears in Collections:Research publications

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