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http://hdl.handle.net/1942/2857
Title: | In-situ SEM observation of electromigration in thin metal films at accelerated stress conditions | Authors: | D'HAEN, Jan VAN OLMEN, Jan BEELEN, Zjef MANCA, Jean MARTENS, Tom DE CEUNINCK, Ward D'OLIESLAEGER, Marc DE SCHEPPER, Luc Cannaerts, M Maex, K |
Issue Date: | 2000 | Publisher: | PERGAMON-ELSEVIER SCIENCE LTD | Source: | MICROELECTRONICS RELIABILITY, 40(8-10). p. 1407-1412 | Abstract: | With so-called in-situ SEM experiments, electromigration experiments are performed in a SEM (scanning electron microscope) equipped with a heating stage. BSE (back scattered electron) images are taken continuously over the entire length of a metal line submitted to high current and temperature stress, monitoring in detail the microstructure. Comparing the electrical resistance curves with the corresponding SEM micrographs and with ex-situ AFM measurements leads to detailed qualitative and quantitative information about the occurring electromigration and precipitation / dissolution effects in the metal lines. (C) 2000 Elsevier Science Ltd. All rights reserved. | Notes: | Limburgs Univ Ctr, Inst Mat Res, B-3590 Diepenbeek, Belgium. Katholieke Univ Leuven, B-3001 Heverlee, Belgium. IMEC, B-3001 Heverlee, Belgium.d'Haen, J, Limburgs Univ Ctr, Inst Mat Res, Wetenschapspk, B-3590 Diepenbeek, Belgium. | Document URI: | http://hdl.handle.net/1942/2857 | DOI: | 10.1016/S0026-2714(00)00170-0 | ISI #: | 000089532800028 | Category: | A1 | Type: | Journal Contribution | Validations: | ecoom 2001 |
Appears in Collections: | Research publications |
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