Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/31592
Title: Shaping the future of nanoelectronics beyond the Si roadmap with new materials and devices
Authors: Heyns, Marc
Bellenger, Florence
BRAMMERTZ, Guy 
Caymax, Matty
Cantoro, Mirco
De Gendt, Stefan
De Jaeger, Brice
Delabie, Annelies
Eneman, Geert
Groeseneken, Guido
Hellings, Geert
Houssa, Michel
Iacopi, Francesca
Leonelli, Daniele
Lin, Dennis
Magnus, Wim
Martens, Koen
Merckling, Clement
MEURIS, Marc 
Mitard, Jerome
Penaud, Julien
Pourtois, Geoffrey
Scarrozza, Marc
Simoen, Eddy
Soree, Bart
Van Elshocht, Sven
Vandenberghe, William
Vandooren, Anne
Vereecke, Philippe
Verhulst, Anne
Wang, Wei-E
Issue Date: 2010
Publisher: SPIE-INT SOC OPTICAL ENGINEERING
Source: Dusa, MV; Conley, W (Ed.). Optical Microlithography XXIII, SPIE-INT SOC OPTICAL ENGINEERING, (Art N° UNSP 764003)
Series/Report: Proceedings of SPIE
Series/Report no.: 7640
Abstract: The use of high mobility channel materials such as Ge and III/V compounds for CMOS applications is being explored. The introduction of these new materials also opens the path towards the introduction of novel device structures which can be used to lower the supply voltage and reduce the power consumption. The results illustrate the possibilities that are created by the combination of new materials and devices to allow scaling of nanoelectronics beyond the Si roadmap.
Notes: Heyns, M (corresponding author), IMEC, Kapeldreef 75, B-3001 Leuven, Belgium.
Keywords: nanoelectronics;high mobility materials;Ge;III/V;new devices;tunnelFET's;nanowires;MOLECULAR-BEAM EPITAXY;OXIDE-SEMICONDUCTOR CAPACITORS;FIELD-EFFECT TRANSISTORS;LAYER-DEPOSITED AL2O3;ELECTRICAL-PROPERTIES;ELECTRONIC-PROPERTIES;SURFACE PASSIVATION;SILICON NANOWIRES;LOW-TEMPERATURE;FERMI-LEVEL
Document URI: http://hdl.handle.net/1942/31592
ISBN: 978-0-8194-8054-5
DOI: 10.1117/12.852587
ISI #: WOS:000285084400001
Rights: 2010 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Category: C1
Type: Proceedings Paper
Appears in Collections:Research publications

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