Design of a new test structure for the study of electromigration with early resistance change measurements

Abstract

A new test structure has been designed in order to perform accurate early resistance change measurements in metal lines submitted to high current stress. This test structure integrates both advantages of the so-called ''absolute'' and ''bridge'' techniques, resulting in accurate resistance measurements with a high resolution for both the current-stressed and reference strip. Due to the improved measurement configuration, the aging kinetics of a metal line under current stress can be studied in more detail. (C) 1997 Elsevier Science Ltd.