Please use this identifier to cite or link to this item: http://hdl.handle.net/1942/42789
Title: Comparative study of the interface passivation properties of LiF and Al2O3 using silicon MIS capacitor
Authors: PARION, Jonathan 
SCAFFIDI, Romain 
DUERINCKX, Filip 
SIVARAMAKRISHNAN RADHAKRISHNAN, Hariharsudan 
Flandre, Denis
POORTMANS, Jef 
VERMANG, Bart 
Issue Date: 2024
Publisher: 
Source: APPLIED PHYSICS LETTERS, 124 (14) (Art N° 142901)
Document URI: http://hdl.handle.net/1942/42789
ISSN: 0003-6951
e-ISSN: 1077-3118
DOI: 10.1063/5.0203484
Category: A1
Type: Journal Contribution
Appears in Collections:Research publications

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