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http://hdl.handle.net/1942/42789
Title: | Comparative study of the interface passivation properties of LiF and Al2O3 using silicon MIS capacitor | Authors: | PARION, Jonathan SCAFFIDI, Romain DUERINCKX, Filip SIVARAMAKRISHNAN RADHAKRISHNAN, Hariharsudan Flandre, Denis POORTMANS, Jef VERMANG, Bart |
Issue Date: | 2024 | Publisher: | Source: | APPLIED PHYSICS LETTERS, 124 (14) (Art N° 142901) | Document URI: | http://hdl.handle.net/1942/42789 | ISSN: | 0003-6951 | e-ISSN: | 1077-3118 | DOI: | 10.1063/5.0203484 | Category: | A1 | Type: | Journal Contribution |
Appears in Collections: | Research publications |
Files in This Item:
File | Description | Size | Format | |
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142901_1_5.0203484.pdf Restricted Access | Published version | 1.42 MB | Adobe PDF | View/Open Request a copy |
JParion_LiF_MOS_author_version.pdf | Peer-reviewed author version | 350.11 kB | Adobe PDF | View/Open |
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