DE SCHEPPER, Luc

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DE SCHEPPER, Luc
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luc.deschepper@uhasselt.be
 
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Publications

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Date Issued:  [1991 TO 1999]
Author:  D'Haeger, V

Results 1-7 of 7 (Search time: 0.002 seconds).

Issue DateTitleContributor(s)TypeCat.
11999The kinetics of the early stages of electromigration and concurrent temperature induced processes in thin film metallisations studied by means of an in-situ high resolution resistometric techniqueVAN OLMEN, Jan; MANCA, Jean; DE CEUNINCK, Ward; DE SCHEPPER, Luc; D'Haeger, V; Witvrouw, A; Maex, K; Vandevelde, B; Beyne, E; Tielemans, LJournal Contribution
21998The influence of addition elements on the early resistance changes observed during electromigration testing of Al metal linesDE CEUNINCK, Ward; D'Haeger, V; VAN OLMEN, Jan; Witvrouw, A; Maex, K; DE SCHEPPER, Luc; De Pauw, P; Pergoot, AJournal Contribution
31998Overview of the kinetics of the early stages of electromigration under low (= realistic) current density stressVAN OLMEN, Jan; MANCA, Jean; DE CEUNINCK, Ward; DE SCHEPPER, Luc; D'Haeger, V; Witvrouw, A; Maex, KJournal Contribution
41998Localized monitoring of electromigration with early resistance change measurementsMANCA, Jean; CROES, Kristof; DE CEUNINCK, Ward; D'Haeger, V; D'HAEN, Jan; Depauw, P; Tielemans, L; DE SCHEPPER, LucJournal Contribution
51997Design of a new test structure for the study of electromigration with early resistance change measurementsDE CEUNINCK, Ward; MANCA, Jean; D'Haeger, V; VAN OLMEN, Jan; DE SCHEPPER, Luc; STALS, LambertJournal Contribution
61994Reliability study of on-chip interconnects - prediction of electromigration resistance on a short-time scaleDE CEUNINCK, Ward; D'Haeger, V; Stulens, Herwig; DE SCHEPPER, Luc; STALS, LambertProceedings Paper
71994The use of early resistance and early tcr changes to predict the reliability of on-chip interconnectsD'Haeger, V; Stulens, Herwig; DE CEUNINCK, Ward; DE SCHEPPER, Luc; Tielemans, L; Gallopyn, G; Depauw P; STALS, LambertJournal Contribution