Full Name
HARDY, An
Email
an.hardy@uhasselt.be
 
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Publications

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Author:  Van Elshocht, S.

Results 1-14 of 14 (Search time: 0.005 seconds).

Issue DateTitleContributor(s)TypeCat.
12012Gadolinium -niobates and -tantalates: Amorphous High-k Materials by Aqueous CSDDEWULF, Daan; HARDY, An; Van Elshocht, S.; DE DOBBELAERE, Christopher; Wang, W. C.; Badylevich, M.; Afanas'ev, V. V.; De Gendt, S.; VAN BAEL, MarliesJournal ContributionA1
22012Properties and thermal stability of solution processed ultrathin, high-k bismuth titanate (Bi2Ti2O7) filmsHARDY, An; Van Elshocht, S.; DE DOBBELAERE, Christopher; Hadermann, J.; Pourtois, G.; De Gendt, S.; Afanas'ev, V. V.; VAN BAEL, MarliesJournal ContributionA1
32011Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution depositionDEWULF, Daan; PEYS, Nick; Van Elshocht, S.; Rampelberg, G.; Detavernier, C.; De Gendt, S.; HARDY, An; VAN BAEL, MarliesJournal ContributionA1
42011Stabilization of ambient sensitive atomic layer deposited lanthanum aluminates by annealing and in situ cappingSwerts, J.; GIELIS, Sven; Vereecke, G.; HARDY, An; DEWULF, Daan; Adelmann, C.; VAN BAEL, Marlies; Van Elshocht, S.Journal ContributionA1
52010Dielectric Response of Ta2O5, Nb2O5, and NbTaO5 from First-Principles InvestigationsClima, S.; Pourtois, G.; HARDY, An; Van Elshocht, S.; VAN BAEL, Marlies; De Gendt, S.; Wouters, D. J.; Heyns, M.; Kittl, J. A.Journal ContributionA1
62010Atomic Layer Deposition of Gd-Doped HfO2 Thin FilmsAdelmann, C.; Tielens, H.; DEWULF, Daan; HARDY, An; Pierreux, D.; Swerts, J.; Rosseel, E.; Shi, X.; VAN BAEL, Marlies; Kittl, J. A.; Van Elshocht, S.Journal ContributionA1
72010Properties of Ultrathin High Permittivity (Nb1-xTax)(2)O-5 Films Prepared by Aqueous Chemical Solution DepositionHARDY, An; Van Elshocht, S.; DEWULF, Daan; Clima, S.; PEYS, Nick; Adelmann, C.; Opsomer, K.; Favia, P.; Bender, Hugo; Hoflijk, I.; Conard, T.; Franquet, A.; VAN DEN RUL, Heidi; Kittl, J. A.; De Gendt, S.; VAN BAEL, Marlies; MULLENS, JulesJournal ContributionA1
82010Strontium niobate high-k dielectrics: Film deposition and material propertiesHARDY, An; Van Elshocht, S.; Adelmann, C.; Kittl, J. A.; De Gendt, S.; Heyns, M.; D'HAEN, Jan; D'Olieslaeger, A.; VAN BAEL, Marlies; VAN DEN RUL, Heidi; MULLENS, JulesJournal ContributionA1
92009Alternative high-k dielectrics for semiconductor applicationsVan Elshocht, S.; Adelmann, C.; Clima, S.; Pourtois, G.; Conard, T.; Delabie, A.; Franquet, A.; Lehnen, P.; Meersschaut, J.; Menou, N.; Popovici, M.; Richard, O.; Schram, T.; Wang, X. P.; HARDY, An; DEWULF, Daan; VAN BAEL, Marlies; Blomberg, T.; Pierreux, D.; Swerts, J.; Maes, J. W.; Wouters, D. J.; De Gendt, S.; Kittl, J. A.Journal ContributionA1
102009Study of interfacial reactions and phase stabilization of mixed Sc, Dy, Hf high-k oxides by attenuated total reflectance infrared spectroscopyHARDY, An; Adelmann, C.; Van Elshocht, S.; VAN DEN RUL, Heidi; VAN BAEL, Marlies; De Gendt, S.; D'OLIESLAEGER, Marc; Heyns, M.; Kittl, J.A.; MULLENS, JulesJournal ContributionA1
112008Impact of process optimizations on the electrical performance of high-k layers deposited by aqueous chemical solution depositionVan Elshocht, S.; HARDY, An; Adelmann, Christoph; Caymax, M.; Conard, T.; Franquet, A.; Richard, O.; VAN BAEL, Marlies; MULLENS, Jules; De Gendt, S.Journal ContributionA1
122008Aqueous solution-gel preparation of ultrathin ZrO2 films for gate dielectric applicationHARDY, An; Van Elshocht, S.; Adelmann, C.; Conard, T.; Franquet, A.; DOUHERET, Olivier; HAELDERMANS, Ilse; D'HAEN, Jan; De Gendt, S.; Caymax, M.; Heyns, M.; D'OLIESLAEGER, Marc; VAN BAEL, Marlies; MULLENS, JulesJournal ContributionA1
132007Aqueous chemical solution deposition - Fast screening method for alternative high-k materials applied to Nd2O3Van Elshocht, S.; HARDY, An; Witters, T.; Adelmann, C.; Caymax, M.; Conard, T.; De Gendt, S.; Franquet, A.; Richard, O.; VAN BAEL, Marlies; MULLENS, Jules; Heyns, M.Journal ContributionA1
142006Alternative gate dielectric materialsVan Elshocht, S.; HARDY, An; De Gendt, S.; Adelmann, D.; Brunco, D.; Caymax, M.; Conard, T.; Delugas, P.; Lehnen, P.; Shamiryan, D.; Vos, R.; Witters, P.; Zimmerman, P.; MEURIS, Marc; Heyns, M.Proceedings PaperC2